Generation of diffraction-free beams for applications in optical microlithography
Author(s) -
Miklós Erdélyi,
Z. L. Horváth,
G. Szabó,
Zs. Bor,
Frank K. Tittel,
Joseph R. Cavallaro,
Michael C. Smayling
Publication year - 1997
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.589280
Subject(s) - optics , diffraction , interferometry , interference (communication) , materials science , fabrication , depth of focus (tectonics) , transverse plane , bessel function , focus (optics) , fabry–pérot interferometer , phase (matter) , optoelectronics , physics , laser , computer science , medicine , paleontology , channel (broadcasting) , alternative medicine , subduction , structural engineering , pathology , quantum mechanics , biology , tectonics , engineering , computer network
A new concept based on a Fabry–Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potential applications in microlithography such as the fabrication of small isolated patterns. It was experimentally demonstrated that the depth of focus can be increased by a factor of about 2, and simultaneously the transverse resolution improved by a factor of 1.6, when using this technique to image contact holes. The properties of simultaneous imaging of two contact holes were also investigated. It was shown experimentally that, even in the most critical case ~when the first diffraction rings overlap!, undesirable interference effects between the adjacent contact holes can be eliminated by means of a phase shifting technique.Texas InstrumentsNational Science FoundationOTKA Foundation of the Hungarian Academy of Science
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