Open AccessInitial operation of a large-scale plasma source ion implantation experiment
Author(s) -
B.P. Wood,
I. Henins,
R. J. Gribble,
W.A. Reass,
R.J. Faehl,
M. Nastasi,
D. J. Rej
Publication year - 1994
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.587362
Subject(s) - plasma , materials science , ion implantation , ion , atomic physics , ion current , ionization , voltage , pulse duration , current density , pulse (music) , optoelectronics , optics , chemistry , laser , physics , nuclear physics , organic chemistry , quantum mechanics
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