Open AccessMagnetic insulation of secondary electrons in plasma source ion implantation
Author(s) -
D. J. Rej,
B.P. Wood,
R. J. Faehl,
H. H. Fleischmann
Publication year - 1994
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.587360
Subject(s) - electron , secondary electrons , plasma , atomic physics , ion , cathode , secondary emission , materials science , electric field , magnetic field , physics , chemistry , nuclear physics , quantum mechanics
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