Open AccessInductively coupled plasma-induced etch damage of GaN p-n junctions
Author(s) -
R. J. Shul,
L. Zhang,
Albert G. Baca,
C. G. Willison,
Jung Han,
S. J. Pearton,
F. Ren
Publication year - 2000
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.582313
Subject(s) - inductively coupled plasma , materials science , plasma , diode , optoelectronics , etching (microfabrication) , ion , plasma etching , nitride , reactive ion etching , analytical chemistry (journal) , chemistry , nanotechnology , layer (electronics) , physics , organic chemistry , quantum mechanics , chromatography
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