Open AccessIon and neutral species in C2F6 and CHF3 dielectric etch discharges
Author(s) -
Raviprakash Jayaraman,
R.T. McGrath,
G. A. Hebner
Publication year - 1999
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.581850
Subject(s) - wafer , chemistry , photoresist , ionization , analytical chemistry (journal) , ion , silicon , electron ionization , ion source , materials science , optoelectronics , environmental chemistry , organic chemistry , layer (electronics)
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