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Submicron contacts for electrical characterization of semiconducting WS2 thin films
Author(s) -
Christophe Ballif,
M. Regula,
F. Lévy,
Frank Burmeister,
Claudia Schäfle,
Th.W Matthes,
P. Leiderer,
Ph. Niedermann,
W. Gutmannsbauer,
R. Bucher
Publication year - 1998
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.581266
Subject(s) - materials science , crystallite , grain boundary , diode , optoelectronics , electrode , semiconductor , photocurrent , thin film , doping , nanotechnology , composite material , chemistry , microstructure , metallurgy
We report a new method to characterize the local electronic properties of polycrystalline semiconducting thin films. A lattice of triangular gold electrodes, with a typical area of 0.2 μm2, is evaporated on a p-type WS2 film. With the help of a conductive atomic force microscope, the current–voltage characteristics of the contacts established between the gold electrodes and the WS2 film are measured. A linear dependence of the current versus voltage is obtained on gold triangles in contact with grain edges. This indicates a high level of doping or degeneracy of the semiconductor at the grain edges. The electrodes deposited on flat WS2 crystallites form rectifying diodes with the underlying grains. Barrier heights of 0.56–0.74 eV and diode ideality factors between 1.15 and 2 are determined. Under illumination, open-circuit voltages up to 500 mV can be measured on some contacts. A short response time of the photocurrent is observed (<0.1 ms) when the diodes are reversed biased, which is related to intrinsic...

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