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Effect of oxidant on resputtering of Bi from Bi–Sr–Ca–Cu–O films
Author(s) -
J. M. Grace,
Daniel B. McDonald,
M. T. Reiten,
J. Olson,
R. T. Kampwirth,
K. E. Gray
Publication year - 1992
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.578051
Subject(s) - oxygen , ozone , analytical chemistry (journal) , ion , argon , materials science , sputter deposition , copper , sputtering , inorganic chemistry , chemistry , thin film , nanotechnology , metallurgy , environmental chemistry , organic chemistry

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