Open AccessVacuum behavior of the x-ray lithography source
Author(s) -
H. J. Halama,
J. B. Murphy
Publication year - 1992
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.578029
Subject(s) - photoelectric effect , synchrotron radiation , synchrotron light source , synchrotron , desorption , storage ring , vacuum chamber , atomic physics , beam (structure) , optics , photon , beamline , materials science , ion , absorption (acoustics) , physics , chemistry , adsorption , organic chemistry , quantum mechanics , composite material
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