Open AccessPumping behavior of sputtering ion pump
Author(s) -
T. S. Chou,
Jiřı́ Bittner,
J. C. Schuchman
Publication year - 1992
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.577951
Subject(s) - anode , cathode , materials science , ion , sputtering , magnetic field , analytical chemistry (journal) , atomic physics , chemistry , electrode , nanotechnology , thin film , physics , organic chemistry , quantum mechanics , chromatography
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