High rate sputter deposition of wear resistant tantalum coatings
Author(s) -
Dean W. Matson,
M. D. Merz,
E.D. McClanahan
Publication year - 1992
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.577748
Subject(s) - tantalum , materials science , sputtering , metallurgy , ductility (earth science) , sputter deposition , substrate (aquarium) , brittleness , phase (matter) , deposition (geology) , tantalum nitride , composite material , tetragonal crystal system , triode , thin film , nanotechnology , creep , voltage , oceanography , chemistry , biology , capacitor , paleontology , quantum mechanics , physics , organic chemistry , sediment , geology
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