Open AccessSurface roughening of Ge(001) during 200 eV Xe ion bombardment and Ge molecular beam epitaxy
Author(s) -
Eric Chason,
J. Y. Tsao,
K.M. Horn,
S. T. Picraux,
Harry A. Atwater
Publication year - 1990
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.576724
Subject(s) - ion , molecular beam epitaxy , atomic physics , materials science , diffusion , ion beam , thermal diffusivity , electron diffraction , surface roughness , molecular physics , chemistry , diffraction , epitaxy , optics , nanotechnology , layer (electronics) , composite material , thermodynamics , physics , organic chemistry , quantum mechanics
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