Open AccessCharacterization of aluminum–aluminum nitride coatings sputter deposited using the pulsed gas process
Author(s) -
R. W. Springer,
C. D. Hosford
Publication year - 1982
Publication title -
journal of vacuum science and technology
Language(s) - English
Resource type - Journals
eISSN - 2331-1754
pISSN - 0022-5355
DOI - 10.1116/1.571334
Subject(s) - materials science , auger electron spectroscopy , sputtering , sputter deposition , nitride , boron nitride , composite material , metallurgy , cavity magnetron , coating , aluminium , analytical chemistry (journal) , thin film , nanotechnology , layer (electronics) , chemistry , physics , chromatography , nuclear physics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom