Open AccessRate and pressure dependence of contaminants in vacuum-deposited aluminum films
Author(s) -
R. W. Springer,
Duane S. Catlett
Publication year - 1978
Publication title -
journal of vacuum science and technology
Language(s) - English
Resource type - Journals
eISSN - 2331-1754
pISSN - 0022-5355
DOI - 10.1116/1.569481
Subject(s) - auger electron spectroscopy , analytical chemistry (journal) , impurity , residual gas analyzer , sputtering , aluminium , oxygen , materials science , partial pressure , spectroscopy , contamination , thin film , chemistry , mass spectrometry , metallurgy , environmental chemistry , nanotechnology , ecology , physics , organic chemistry , chromatography , quantum mechanics , nuclear physics , biology
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