Open AccessDirect plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
Author(s) -
David Dustin Fischer,
Martin Knaut,
Johanna Reif,
Frederik Nehm,
Matthias Albert,
Johann W. Bartha
Publication year - 2020
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5131087
Subject(s) - materials science , analytical chemistry (journal) , x ray photoelectron spectroscopy , ellipsometry , scanning electron microscope , atomic layer deposition , thin film , polyethylene naphthalate , dielectric , transmission electron microscopy , layer (electronics) , chemical engineering , nanotechnology , chemistry , composite material , optoelectronics , chromatography , engineering
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