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Ion bombardment induced formation of self-organized wafer-scale GaInP nanopillar assemblies
Author(s) -
Dennis Visser,
Juliana Jaramillo-Fernández,
Gabriel Haddad,
C. M. Sotomayor Torres,
S. Anand
Publication year - 2019
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5127265
Subject(s) - nanopillar , materials science , ion beam , sputtering , wafer , optoelectronics , ion , ion beam lithography , electron beam lithography , indium phosphide , focused ion beam , optics , nanostructure , nanotechnology , gallium arsenide , resist , thin film , layer (electronics) , chemistry , physics , organic chemistry

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