Open AccessHexagonal boron nitride grown using high atomic boron emission during microwave plasma chemical vapor deposition
Author(s) -
Kallol Chakrabarty,
Ivan Arnold,
Shane A. Catledge
Publication year - 2019
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5123210
Subject(s) - chemical vapor deposition , boron , boron nitride , materials science , analytical chemistry (journal) , torr , volumetric flow rate , plasma , nitride , thin film , chemistry , nanotechnology , physics , organic chemistry , quantum mechanics , chromatography , layer (electronics) , thermodynamics
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