Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets

Two methods improving the brilliance of laser-induced plasmas emitting in the extreme UV (EUV) and soft x-ray (SXR) regions were investigated, using three different gases (nitrogen, krypton, and xenon) from a pulsed gas jet. Utilizing a newly designed piezoelectric valve, up to almost ten times higher gas pressures were applied, resulting in increased target densities and thus, higher conversion efficiencies of laser energy into EUV and SXR radiation. Secondly, geometrically reducing the angle between the incoming laser beam and the observed plasma emission minimizes reabsorption of the emitted short wavelength radiation. Combining both methods, the source brilliance is increased by a factor of 5 for nitrogen. Furthermore, a compact EUV focusing system for metrological applications is presented utilizing the optimized plasma source. An energy density of 1 mJ/cm2 at wavelength λ = 13.5 nm in the focal spot of an ellipsoidal mirror is achieved with xenon as the target gas being sufficient for material removal of PMMA samples with an ablation rate of 0.05 nm/pulse.Two methods improving the brilliance of laser-induced plasmas emitting in the extreme UV (EUV) and soft x-ray (SXR) regions were investigated, using three different gases (nitrogen, krypton, and xenon) from a pulsed gas jet. Utilizing a newly designed piezoelectric valve, up to almost ten times higher gas pressures were applied, resulting in increased target densities and thus, higher conversion efficiencies of laser energy into EUV and SXR radiation. Secondly, geometrically reducing the angle between the incoming laser beam and the observed plasma emission minimizes reabsorption of the emitted short wavelength radiation. Combining both methods, the source brilliance is increased by a factor of 5 for nitrogen. Furthermore, a compact EUV focusing system for metrological applications is presented utilizing the optimized plasma source. An energy density of 1 mJ/cm2 at wavelength λ = 13.5 nm in the focal spot of an ellipsoidal mirror is achieved with xenon as the target gas being sufficient for material remov...