Open AccessOn evaporation via an inclined rotating circular lift-off shadow or stencil mask
Author(s) -
S. Arscott
Publication year - 2018
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5057404
Subject(s) - undercut , photoresist , optics , resist , wafer , curvature , lift (data mining) , materials science , stencil , shadow mask , micrometer , geometry , mechanics , physics , nanotechnology , composite material , layer (electronics) , computer science , data mining , thermodynamics , mathematics
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