Open AccessBlock copolymer selectivity: A new dry etch approach for cylindrical applications
Author(s) -
A Sarrazin,
N. Possémé,
Patricia PimentaBarros,
S. Barnola,
Ahmed Gharbi,
Maxime Argoud,
Raluca Tiron,
Christophe Cardinaud
Publication year - 2018
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5034133
Subject(s) - copolymer , selectivity , materials science , polystyrene , wafer , polymer , block (permutation group theory) , methyl methacrylate , x ray photoelectron spectroscopy , blanket , polymer chemistry , chemical engineering , nanotechnology , chemistry , composite material , organic chemistry , geometry , mathematics , engineering , catalysis
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