Open AccessImpact of the sequence of precursor introduction on the growth and properties of atomic layer deposited Al-doped ZnO films
Author(s) -
Harold Le Tulzo,
Nathanaëlle Schneider,
Daniel Lincot,
G. Patriarche,
Frédérique Donsanti
Publication year - 2018
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5030990
Subject(s) - quartz crystal microbalance , doping , atomic layer deposition , zinc , materials science , deposition (geology) , aluminium , band gap , thin film , layer (electronics) , analytical chemistry (journal) , oxide , chemical engineering , chemistry , nanotechnology , organic chemistry , optoelectronics , metallurgy , adsorption , paleontology , sediment , engineering , biology
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