Open AccessPolycarbonate as a negative-tone resist for electron-beam lithography
Author(s) -
Nan Zheng,
Haodi Min,
Youwei Jiang,
Xing Cheng
Publication year - 2018
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5012028
Subject(s) - resist , polycarbonate , electron beam lithography , materials science , lithography , raman spectroscopy , cathode ray , polymer , tone (literature) , optoelectronics , layer (electronics) , optics , nanotechnology , composite material , electron , art , physics , literature , quantum mechanics
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