Open AccessPatterned films by atomic layer deposition using Parafilm as a mask
Author(s) -
Chao Zhang,
Jesse Kalliomäki,
Markku Leskelä,
Mikko Ritala
Publication year - 2017
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5001033
Subject(s) - atomic layer deposition , materials science , substrate (aquarium) , outgassing , nanotechnology , layer (electronics) , deposition (geology) , optoelectronics , chemistry , oceanography , organic chemistry , geology , paleontology , sediment , biology
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