Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography | Zendy

Mathieu Caillau | Zendy; Pierre Crémillieu | Zendy; Emmanuelle Laurenceau | Zendy; Yann Chevolot | Zendy; JeanLouis Leclercq | Zendy; С. А. Алексеев | Zendy; Céline Chevalier | Zendy; Thierry Delair | Zendy

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Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography

Author(s) -

Mathieu Caillau,

Pierre Crémillieu,

Emmanuelle Laurenceau,

Yann Chevolot,

JeanLouis Leclercq,

С. А. Алексеев,

Céline Chevalier,

Thierry Delair

Publication year - 2017

Publication title -

journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.429

H-Index - 119

eISSN - 2166-2754

pISSN - 2166-2746

DOI - 10.1116/1.4996870

Subject(s) - materials science , electron beam lithography , lithography , etching (microfabrication) , resist , nanometre , chitosan , stencil lithography , layer (electronics) , polymer , reactive ion etching , nanotechnology , ion beam lithography , plasma etching , cathode ray , optoelectronics , chemical engineering , composite material , electron , physics , quantum mechanics , engineering

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