Open AccessReview Article: Reactions of fluorine atoms with silicon, revisited, again
Author(s) -
Vincent M. Donnelly
Publication year - 2017
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4983922
Subject(s) - flux (metallurgy) , silicon , fluorine , atom (system on chip) , etching (microfabrication) , chemistry , chemical reaction , plasma , ion , atomic physics , isotropy , plasma etching , analytical chemistry (journal) , physics , organic chemistry , nuclear physics , optics , layer (electronics) , computer science , embedded system
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