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1.5 MeV electron irradiation damage in β-Ga2O3 vertical rectifiers
Author(s) -
Jiancheng Yang,
F. Ren,
S. J. Pearton,
Gwangseok Yang,
Jihyun Kim,
Akito Kuramata
Publication year - 2017
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4983377
Subject(s) - fluence , materials science , diode , irradiation , electron beam processing , electron , reverse bias , biasing , cathode ray , analytical chemistry (journal) , optoelectronics , atomic physics , voltage , chemistry , electrical engineering , physics , nuclear physics , chromatography , engineering
Vertical rectifiers fabricated on epi Ga2O3 on bulk β-Ga2O3 were subject to 1.5 MeV electron irradiation at fluences from 1.79 × 1015 to 1.43 × 1016 cm−2 at a fixed beam current of 10−3 A. The electron irradiation caused a reduction in carrier concentration in the epi Ga2O3, with a carrier removal rate of 4.9 cm−1. The 2 kT region of the forward current–voltage characteristics increased due to electron-induced damage, with an increase in diode ideality factor of ∼8% at the highest fluence and a more than 2 order of magnitude increase in on-state resistance. There was a significant reduction in reverse bias current, which scaled with electron fluence. The on/off ratio at −10 V reverse bias voltage was severely degraded by electron irradiation, decreasing from ∼107 in the reference diodes to ∼2 × 104 for the 1.43 × 1016 cm−2 fluence. The reverse recovery characteristics showed little change even at the highest fluence, with values in the range of 21–25 ns for all rectifiers.

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