Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme ultraviolet lithography | Zendy

Vishal Desai | Zendy; Mac Mellish | Zendy; Stephen Earl Bennett | Zendy; Nathaniel C. Cady | Zendy

Open Access

Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme ultraviolet lithography

Author(s) -

Vishal Desai,

Mac Mellish,

Stephen Earl Bennett,

Nathaniel C. Cady

Publication year - 2017

Publication title -

journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.429

H-Index - 119

eISSN - 2166-2754

pISSN - 2166-2746

DOI - 10.1116/1.4975797

Subject(s) - extreme ultraviolet lithography , hydrogen silsesquioxane , resist , extreme ultraviolet , materials science , lithography , next generation lithography , multiple patterning , scanner , electron beam lithography , optoelectronics , wafer , interference lithography , optics , nanotechnology , physics , laser , fabrication , medicine , alternative medicine , layer (electronics) , pathology

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