English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

Thin films of amorphous TiO2 are grown by direct current (DC) reactive magnetron sputtering. Using modern models of DC reactive sputtering, conditions were established to maximize control of the O:Ti ratio by indirectly monitoring the change in ion-induced secondary electron emission of the Ti target. The Ti resistivity was continuously varied through over 12 orders of magnitude, and changes in stoichiometry were observed by Rutherford backscattering. Combining observed changes in stoichiometry with a predictive model of the composition, a percolative transition could be observed exhibiting universal and nonuniversal scaling parameters.

Maximizing stoichiometry control in reactive sputter deposition of TiO2