Open AccessIncreased drift carrier lifetime in semiconducting boron carbides deposited by plasma enhanced chemical vapor deposition from carboranes and benzene
Author(s) -
George Peterson,
Elena Echeverría,
Bin Dong,
Joseph P. Silva,
Ethiyal R. Wilson,
Jeffry A. Kelber,
M. Nastasi,
Peter A. Dowben
Publication year - 2016
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4973338
Subject(s) - plasma enhanced chemical vapor deposition , boron carbide , materials science , benzene , boron , chemical vapor deposition , silicon carbide , carbide , analytical chemistry (journal) , composite material , nanotechnology , chemistry , organic chemistry