Open AccessAs2S3 thin films deposited by atomic layer deposition
Author(s) -
Elina Färm,
Mikko Heikkilä,
Marko Vehkamäki,
Kenichiro Mizohata,
Mikko Ritala,
Markku Leskelä,
Marianna Kemell
Publication year - 2016
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4968202
Subject(s) - thin film , arsine , atomic layer deposition , amorphous solid , layer (electronics) , impurity , materials science , deposition (geology) , analytical chemistry (journal) , chemical vapor deposition , silicon , chemistry , metallurgy , crystallography , nanotechnology , organic chemistry , catalysis , paleontology , sediment , phosphine , biology
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