Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps | Zendy

R. Vallat | Zendy; R. Gassilloud | Zendy; Brice Eychenne | Zendy; C. Vallée | Zendy

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Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps

Author(s) -

R. Vallat,

R. Gassilloud,

Brice Eychenne,

C. Vallée

Publication year - 2016

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/1.4965966

Subject(s) - atomic layer deposition , substrate (aquarium) , materials science , deposition (geology) , layer (electronics) , etching (microfabrication) , plasma , tin , plasma etching , atomic layer epitaxy , thin film , analytical chemistry (journal) , nanotechnology , optoelectronics , chemical engineering , chemistry , metallurgy , environmental chemistry , paleontology , physics , sediment , geology , oceanography , quantum mechanics , engineering , biology

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