Open AccessOverview of atomic layer etching in the semiconductor industry
Author(s) -
Keren J. Kanarik,
Thorsten Lill,
Eric A. Hudson,
Saravanapriyan Sriraman,
Samantha Tan,
Jeffrey M. Marks,
V. Vahedi,
Richard A. Gottscho
Publication year - 2015
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4913379
Subject(s) - etching (microfabrication) , semiconductor industry , nanotechnology , atomic layer deposition , engineering physics , semiconductor , microelectronics , limiting , materials science , reactive ion etching , silicon , layer (electronics) , engineering , optoelectronics , mechanical engineering , manufacturing engineering
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