Smart-cut layer transfer of single-crystal SiC using spin-on-glass
Author(s) -
JaeHyung Lee,
Igor Bargatin,
Joonsuk Park,
Kaveh M. Milaninia,
Luke Theogarajan,
Robert Sinclair,
Roger T. Howe
Publication year - 2012
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4734006
Subject(s) - materials science , wafer , layer (electronics) , chemical mechanical planarization , polishing , surface roughness , silicon carbide , composite material , surface finish , thermal transfer , wafer bonding , microelectromechanical systems , optoelectronics
The authors demonstrate “smart-cut”-type layer transfer of single-crystal silicon carbide (SiC) by using spin-on-glass (SoG) as an adhesion layer. Using SoG as an adhesion layer is desirable because it can planarize the surface, facilitate an initial low temperature bond, and withstand the thermal stresses at high temperature where layer splitting occurs (800–900 °C). With SoG, the bonding of wafers with a relatively large surface roughness of 7.5–12.5 A rms can be achieved. This compares favorably to direct (fusion) wafer bonding, which usually requires extremely low roughness (<2 A rms), typically achieved using chemical mechanical polishing (CMP) after implantation. The higher roughness tolerance of the SoG layer transfer removes the need for the CMP step, making the process more reliable and affordable for expensive materials like SiC. To demonstrate the reliability of the smart-cut layer transfer using SoG, we successfully fabricated a number of suspended MEMS structures using this technology.
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