In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography | Zendy

Sheng-Yung Chen | Zendy; Kuen-Yu Tsai | Zendy; Philip C. W. Ng | Zendy; Hoi-Tou Ng | Zendy; Chun-Hung Liu | Zendy; Yu-Tian Shen | Zendy; Chieh-Hsiung Kuan | Zendy; YungYaw Chen | Zendy; Yi-Hung Kuo | Zendy; Cheng-Ju Wu | Zendy; JiaYush Yen | Zendy

Open Access

In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography

Author(s) -

Sheng-Yung Chen,

Kuen-Yu Tsai,

Philip C. W. Ng,

Hoi-Tou Ng,

Chun-Hung Liu,

Yu-Tian Shen,

Chieh-Hsiung Kuan,

YungYaw Chen,

Yi-Hung Kuo,

Cheng-Ju Wu,

JiaYush Yen

Publication year - 2011

Publication title -

journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.429

H-Index - 119

eISSN - 2166-2754

pISSN - 2166-2746

DOI - 10.1116/1.3613697

Subject(s) - optics , electron beam lithography , detector , beam (structure) , physics , lithography , electron , cathode ray , m squared , laser beam quality , resist , materials science , laser , nanotechnology , layer (electronics) , quantum mechanics , laser beams

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