Novel postetch process to realize high quality photonic crystals in InP | Zendy

Naeem Shahid | Zendy; Shagufta Naureen | Zendy; M. Y. Li | Zendy; Marcin Świłło | Zendy; S. Anand | Zendy

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Novel postetch process to realize high quality photonic crystals in InP

Author(s) -

Naeem Shahid,

Shagufta Naureen,

M. Y. Li,

Marcin Świłło,

S. Anand

Publication year - 2011

Publication title -

journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.429

H-Index - 119

eISSN - 2166-2754

pISSN - 2166-2746

DOI - 10.1116/1.3574760

Subject(s) - materials science , photonic crystal , extinction ratio , fabrication , optoelectronics , annealing (glass) , photonic integrated circuit , photonics , wavelength , nanostructure , etching (microfabrication) , indium phosphide , optics , wafer , dry etching , nanotechnology , gallium arsenide , medicine , alternative medicine , physics , pathology , layer (electronics) , composite material

Thermally driven reflow of material during annealing was positively used to obtain near-vertical sidewall profiles for high-aspect-ratio nanostructures in InP fabricated by dry etching. This is ver ...

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