Sub-10-nm nanolithography with a scanning helium beam | Zendy

Vadim Sidorkin | Zendy; Emile van Veldhoven | Zendy; E. van der Drift | Zendy; Paul F. A. Alkemade | Zendy; H. W. M. Salemink | Zendy; Diederik Maas | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Sub-10-nm nanolithography with a scanning helium beam

Author(s) -

Vadim Sidorkin,

Emile van Veldhoven,

E. van der Drift,

Paul F. A. Alkemade,

H. W. M. Salemink,

Diederik Maas

Publication year - 2009

Publication title -

journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena

Language(s) - English

Resource type - Journals

eISSN - 1520-8567

pISSN - 1071-1023

DOI - 10.1116/1.3182742

Subject(s) - hydrogen silsesquioxane , nanolithography , resist , materials science , lithography , helium , ion beam lithography , silsesquioxane , electron beam lithography , beam (structure) , hydrogen , nanotechnology , optoelectronics , optics , fabrication , polymer , atomic physics , chemistry , physics , medicine , organic chemistry , layer (electronics) , composite material , alternative medicine , pathology

Scanning helium ion beam lithography is presented as a promising pattern definition technique for dense sub-10-nm structures. The powerful performance in terms of high resolution, high sensitivity, and a low proximity effect is demonstrated in a hydrogen silsesquioxane resist.QN/Quantum NanoscienceApplied Science

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research