Metal contacts on bulk ZnO crystal treated with remote oxygen plasma
Author(s) -
Z.-Q. Fang,
B. Claflin,
D. C. Look,
Yao-Han Dong,
L. J. Brillson
Publication year - 2009
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.3095814
Subject(s) - materials science , ohmic contact , schottky diode , photoluminescence , oxygen , analytical chemistry (journal) , schottky barrier , metal , capacitance , deep level transient spectroscopy , optoelectronics , nanotechnology , metallurgy , chemistry , electrode , silicon , diode , organic chemistry , layer (electronics) , chromatography
To study the quality of thin metal/ZnO Schottky contacts (SCs), temperature-dependent current-voltage (I-V), capacitance-voltage, deep level transient spectroscopy, and photoluminescence measurements were performed using bulk, vapor-phase ZnO, treated by remote oxygen plasma (ROP). Au∕ZnO and Pd∕ZnO contacts on both O and Zn faces are compared as a function of the ROP processing sequence and duration. We find that (i) as the duration of ROP treatment increases from 2to4h, Au∕ZnO contacts on the Zn face, deposited before ROP treatment, become rectifying, while those on the O face remain Ohmic; (ii) with long-term ROP treatments prior to metallization, both Au∕ZnO and Pd∕ZnO show high-quality SCs; however, their I-V characteristics can be significantly degraded by electric field and high temperatures; (iii) ROP treatment can cause more H removal on the Zn face than on the O face, resulting in a decrease in the near-surface carrier concentration for the Zn face only; (iv) in addition to the dominant bulk-trap E3, surface traps, E6/E7 and E8, and Es, can be observed in Au∕ZnO and Pd∕ZnO SCs, respectively, on the Zn face, with shorter ROP treatment; and (v) with long-term ROP treatment, E3 (or L2) significantly increases and shifts in Au∕ZnO SCs on the Zn face.To study the quality of thin metal/ZnO Schottky contacts (SCs), temperature-dependent current-voltage (I-V), capacitance-voltage, deep level transient spectroscopy, and photoluminescence measurements were performed using bulk, vapor-phase ZnO, treated by remote oxygen plasma (ROP). Au∕ZnO and Pd∕ZnO contacts on both O and Zn faces are compared as a function of the ROP processing sequence and duration. We find that (i) as the duration of ROP treatment increases from 2to4h, Au∕ZnO contacts on the Zn face, deposited before ROP treatment, become rectifying, while those on the O face remain Ohmic; (ii) with long-term ROP treatments prior to metallization, both Au∕ZnO and Pd∕ZnO show high-quality SCs; however, their I-V characteristics can be significantly degraded by electric field and high temperatures; (iii) ROP treatment can cause more H removal on the Zn face than on the O face, resulting in a decrease in the near-surface carrier concentration for the Zn face only; (iv) in addition to the dominant bulk-tra...
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