Open AccessLow temperature plasma etching for Si3N4 waveguide applications
Author(s) -
D. Celo,
Rob Vandusen,
T. Smy,
Jacques Albert,
N. G. Tarr,
P. Waldron
Publication year - 2008
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.2836424
Subject(s) - etching (microfabrication) , electron cyclotron resonance , materials science , reactive ion etching , silicon nitride , plasma , plasma etching , waveguide , optoelectronics , dry etching , anisotropy , silicon , silicon dioxide , optics , nanotechnology , composite material , layer (electronics) , physics , quantum mechanics
Peer reviewed: NoNRC publication: Ye
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