Open AccessInfluence of solubility switching mechanism on resist performance in molecular glass resists
Author(s) -
Richard A. Lawson,
Cheng-Tsung Lee,
Clifford L. Henderson,
Robert Whetsell,
Laren M. Tolbert,
Wang Yueh
Publication year - 2007
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.2801885
Subject(s) - resist , cationic polymerization , epoxide , solubility , materials science , polymerization , cathode ray , condensation , chemical engineering , polymer chemistry , chemistry , polymer , nanotechnology , organic chemistry , electron , composite material , catalysis , layer (electronics) , physics , quantum mechanics , engineering , thermodynamics
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