Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition | Zendy

A. K. Sinha | Zendy; Dennis W. Hess | Zendy; Clifford L. Henderson | Zendy

Open Access

Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition

Author(s) -

A. K. Sinha,

Dennis W. Hess,

Clifford L. Henderson

Publication year - 2007

Publication title -

journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena

Language(s) - English

Resource type - Journals

eISSN - 1520-8567

pISSN - 1071-1023

DOI - 10.1116/1.2782546

Subject(s) - atomic layer deposition , polymer , quartz crystal microbalance , materials science , titanium , layer (electronics) , masking (illustration) , solubility , chemical engineering , sorption , diffusion , deposition (geology) , thermal diffusivity , thin film , diffusion layer , analytical chemistry (journal) , composite material , chemistry , nanotechnology , organic chemistry , adsorption , metallurgy , art , paleontology , visual arts , physics , quantum mechanics , sediment , biology , engineering , thermodynamics

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