Open AccessDirectly patterning ferroelectric films by nanoimprint lithography with low temperature and low pressure
Author(s) -
Kuen-Chang Hsieh,
H. L. Chen,
ChunHung Lin,
C. Y. Lee
Publication year - 2006
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.2395958
Subject(s) - materials science , nanoimprint lithography , ferroelectricity , bilayer , layer (electronics) , nanotechnology , mold , composite material , optoelectronics , fabrication , dielectric , medicine , alternative medicine , pathology , membrane , biology , genetics
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