Open AccessShot noise models for sequential processes and the role of lateral mixing
Author(s) -
A. R. Neureuther,
R. F. W. Pease,
L. C. L. Yuan,
K. Baghbani Parizi,
Hesaam Esfandyarpour,
Wojciech Jacob Poppe,
J. A. Liddle,
Erik H. Anderson
Publication year - 2006
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.2218875
Subject(s) - resist , shot noise , electron , noise (video) , secondary electrons , extreme ultraviolet lithography , chemistry , molecular physics , materials science , optics , physics , nanotechnology , nuclear physics , computer science , layer (electronics) , detector , artificial intelligence , image (mathematics)
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