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Direct observations of rapid diffusion of Cu in Au thin films using in situ x-ray diffraction
Author(s) -
J. W. Elmer,
Todd Palmer,
E. D. Specht
Publication year - 2006
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.2204926
Subject(s) - grain boundary diffusion coefficient , activation energy , materials science , grain boundary , effective diffusion coefficient , annealing (glass) , thin film , diffraction , analytical chemistry (journal) , lattice diffusion coefficient , isothermal process , diffusion , grain size , crystallography , atomic diffusion , grain growth , microstructure , chemistry , thermodynamics , metallurgy , nanotechnology , optics , physics , chromatography , magnetic resonance imaging , radiology , medicine

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