Dry-etch of As2S3 thin films for optical waveguide fabrication | Zendy

Weitang Li | Zendy; Yinlan Ruan | Zendy; Barry LutherDavies | Zendy; Andrei V. Rode | Zendy; Rod Boswell | Zendy

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Dry-etch of As2S3 thin films for optical waveguide fabrication

Author(s) -

Weitang Li,

Yinlan Ruan,

Barry LutherDavies,

Andrei V. Rode,

Rod Boswell

Publication year - 2005

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/1.2049308

Subject(s) - etching (microfabrication) , plasma , helicon , reactive ion etching , sputtering , fabrication , plasma etching , materials science , analytical chemistry (journal) , dry etching , isotropic etching , plasma processing , dilution , surface roughness , thin film , chemistry , layer (electronics) , nanotechnology , composite material , chromatography , medicine , physics , alternative medicine , quantum mechanics , pathology , thermodynamics

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