Open AccessElectron beam lithography process using radiation sensitive carboxylate metalorganic precursors
Author(s) -
Augustin Jeyakumar,
Clifford L. Henderson,
Paul J. Roman,
Seigi Suh
Publication year - 2003
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.1624250
Subject(s) - bilayer , materials science , titanium , oxide , electron beam lithography , analytical chemistry (journal) , layer (electronics) , chemical engineering , nanotechnology , resist , chemistry , organic chemistry , metallurgy , biochemistry , membrane , engineering
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