Open AccessHigh sensitivity actinic detection of native defects on extreme ultraviolet lithography mask blanks
Author(s) -
Moonsuk Yi,
Tsuneyuki Haga,
Chris Walton,
Jeffrey Bokor
Publication year - 2001
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.1410088
Subject(s) - materials science , lithography , ultraviolet , characterization (materials science) , optics , blank , scanning electron microscope , atomic force microscopy , microscopy , light scattering , extreme ultraviolet , coating , substrate (aquarium) , visible spectrum , ultraviolet light , extreme ultraviolet lithography , optoelectronics , scattering , nanotechnology , composite material , physics , laser , oceanography , geology
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