Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD)3 (OD=octanedionate) | Zendy

Junghyun Lee | Zendy; Jooyoung Kim | Zendy; ShiWoo Rhee | Zendy; Dooyoung Yang | Zendy; Donghyun Kim | Zendy; CheolHoon Yang | Zendy; Young-Ki Han | Zendy; Chul-Ju Hwang | Zendy

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Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD)3 (OD=octanedionate)

Author(s) -

Junghyun Lee,

Jooyoung Kim,

ShiWoo Rhee,

Dooyoung Yang,

Donghyun Kim,

CheolHoon Yang,

Young-Ki Han,

Chul-Ju Hwang

Publication year - 2000

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/1.1289693

Subject(s) - metalorganic vapour phase epitaxy , chemical vapor deposition , thin film , electrical resistivity and conductivity , materials science , deposition (geology) , combustion chemical vapor deposition , wafer , substrate (aquarium) , analytical chemistry (journal) , quartz , surface roughness , carbon film , chemical engineering , chemistry , composite material , nanotechnology , layer (electronics) , epitaxy , organic chemistry , electrical engineering , oceanography , engineering , sediment , geology , biology , paleontology

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