Open AccessEmergence and development of chlorhexidine resistance during sporulation of Bacillus subtilis 168
Author(s) -
Shaker L.A.,
Dancer B.N.,
Russell A.D.,
Furr J.R.
Publication year - 1988
Publication title -
fems microbiology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.899
H-Index - 151
eISSN - 1574-6968
pISSN - 0378-1097
DOI - 10.1111/j.1574-6968.1988.tb02971.x
Subject(s) - bacillus subtilis , chlorhexidine , microbiology and biotechnology , spore , resistance (ecology) , biology , chemistry , bacteria , medicine , dentistry , genetics , ecology
During sporulation of Bacillus subtilis strain 168 initiated by step‐down conditions, resistance to chlorhexidine diacetate (CHA) developed at about t 3.5 , before heat but after toluene resistance. Mutants blocked at stage IV of sporulation were sensitive to all three treatments. Stage V mutants were toluene resistant but moderately sensitive to heat and CHA. A stage VI mutant was resistant to all three treatments. Thus, chlorhexidine resistance is likely to be a result of spore coat, rather than of cortex, development.