Open AccessExpression of a plasmid borne ethidium resistance determinant from Staphylococcus in Escherichia coli: Evidence for an efflux system
Author(s) -
Jones I.G.,
Midgley M.
Publication year - 1985
Publication title -
fems microbiology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.899
H-Index - 151
eISSN - 1574-6968
pISSN - 0378-1097
DOI - 10.1111/j.1574-6968.1985.tb00820.x
Subject(s) - plasmid , escherichia coli , efflux , ethidium bromide , biology , microbiology and biotechnology , dna , genetics , gene
A 1.1‐kilobase (kb) DNA fragment derived from a staphylococcal plasmid specifying resistance to ethidium has been cloned into plasmid vector pUC9 in Escherichia coli . This fragment conferred resistant to ethidium and also to cetyltrimethyl ammonium ion in this host. Studies with labelled ethidium indicated that the basis of resistance was extrusion from the cell by an efflux system.