Lateral Nonuniformity Effects of Border Traps on the Characteristics of Metal–Oxide–Semiconductor Field-Effect Transistors Subjected to High-Field Stresses

The lateral nonuniformity (LNU) effects of border traps are studied by exploring both the high- and low-frequency characteristics in N-type channel metal–oxide–semiconductor field-effect transistors. According to experimental data, the deterioration of nonuniformity is significantly enhanced at low frequencies. The cause may be due to the additional trapped charges of border traps (near-interface oxide traps) under the low-frequency measurement. This model is successfully simulated by the combination of low-frequency $C$ – $V$ curves with the heavily and lightly damaged regions. Additionally, the double-peak charge-pumping current is observed in low-frequency measurements, which can further support our hypothesis that border-trap-enhanced LNU exists. Finally, the geometric effect of the polygate and the thickness effect of the gate oxide are also investigated for the nonuniformity issue.