Open AccessDelayed interferometer based Si-wire WDM demultiplexers fabricated by phase controllable and productive 300-mm wafer-scale ArF-immersion lithography technology
Author(s) -
Seok-Hwan Jeong,
Daisuke Shimura,
Takasi Simoyama,
Tsuyoshi Horikawa,
Yu Tanaka,
Ken Morito
Publication year - 2014
Language(s) - English
DOI - 10.1109/ofc.2014.6886789
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